The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 1978
Filed:
Jun. 08, 1977
Applicant:
Inventors:
Akira Yoshikawa, Tokorozawa, JP;
Haruo Nagai, Kawasaki, JP;
Osamu Ochi, Kodaira, JP;
Kazuko Nakano, Machida, JP;
Yoshihiko Mizushima, Fuchu, JP;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
96 67 ; 96 35 ; 96 36 ; 96 88 ; 252501 ;
Abstract
A pattern-forming material comprises a substrate and a radiation sensitive chalcogenide layer disposed thereon. The radiation sensitive chalcogenide layer consists of an amorphous layer having a chemical composition of 75 to 95 mol% of selenium and 5 to 25 mol% of germanium and a silver layer superimposed thereon. The pattern-forming materials having the radiation sensitive chalcogenide layer of the invention are particularly useful in lithographic applications.