Isehara, Japan

Kazuki Noda

This inventor holds 1 USPTO granted patent. Top assignee: Dmg Mori Company Limited. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuki Noda. Retrieved from https://idiyas.com/inventor/kazuki-noda-910ta2pg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Kazuki Noda: Innovator in Displacement Detection Technology.

Introduction

Kazuki Noda is a prominent inventor based in Isehara, Japan. He has made significant contributions to the field of displacement detection technology. His innovative approach has led to the development of a unique device that enhances measurement accuracy.

Latest Patents

Kazuki Noda holds a patent for a "Displacement detecting device with controlled heat generation." This device includes a first diffraction grating, a light source, a displacement detecting unit, and a light receiving unit. The displacement detecting unit comprises a light flux dividing unit, a second diffraction grating, and a reference reflecting member. The device is designed to measure displacement amounts in optical path lengths, ensuring precision in applications where a measured member is displaced.

Career Highlights

Kazuki Noda is currently associated with Dmg Mori Company Limited, where he continues to innovate and develop advanced technologies. His work has been instrumental in enhancing the capabilities of displacement detection systems.

Collaborations

Kazuki collaborates with Hideaki Tamiya, contributing to the advancement of their projects and sharing expertise in their respective fields.

Conclusion

Kazuki Noda's contributions to displacement detection technology exemplify his commitment to innovation and precision. His patent and ongoing work at Dmg Mori Company Limited highlight his role as a key figure in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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