Location History:
- Clifton Park, NY (US) (2012)
- Miyagi, JP (2015)
Company Filing History:
Years Active: 2012-2015
Title: The Innovative Contributions of Kazuhito Tohnoe
Introduction: Kazuhito Tohnoe is a distinguished inventor based in Miyagi, Japan, who has made significant contributions to the field of plasma etching technology. With a total of three patents to his name, his inventive prowess is evident in the cutting-edge methodologies he has developed for silicon processing.
Latest Patents: Tohnoe's latest patents highlight innovative plasma etching methods aimed at enhancing the precision of semiconductor manufacturing. The first patent describes a method for forming holes in a silicon layer while using a protective film formed from carbon monoxide gas. This procedure includes alternating steps of etching and depositing a protective layer, providing an efficient approach to manage delicate silicon oxide films.
The second patent details a plasma etching technique involving the etching of an intermediate silicon-nitrogen layer. This method allows for targeted etching of a silicon layer that lies beneath, initiated by a chlorine gas reaction. Additionally, a process gas containing sulfur and fluorine is utilized to further refine the etching process, resulting in the formation of recesses in the silicon substrate.
Career Highlights: Kazuhito Tohnoe is affiliated with Tokyo Electron Limited, a highly regarded company in the semiconductor and electronics sector. His work there has not only bolstered the company’s technological capabilities but has also contributed to advancements in the semiconductor manufacturing landscape.
Collaborations: Throughout his career, Tohnoe has collaborated with notable professionals, including Yusuke Hirayama and Frank M Cerio, Jr. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas, further enhancing the quality of their research and development efforts.
Conclusion: Kazuhito Tohnoe stands out as an influential inventor whose work in plasma etching methods is significantly impacting semiconductor technology. His contributions, through his patents and collaborations, exemplify how innovative thinking can lead to advancements that shape industries.