Inazawa, Japan

Kazuhito Katoh

This inventor holds 1 USPTO granted patent. Top assignee: Denso Corporation. Active years: 2013.


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Kazuhito Katoh: Innovator in Semiconductor Technology

Introduction

Kazuhito Katoh is a prominent inventor based in Inazawa, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent work. His expertise and dedication to advancing technology have positioned him as a key figure in his industry.

Latest Patents

Kazuhito Katoh holds a patent for a semiconductor device and a method of patterning a resin insulation layer on the substrate of the same. This patent describes a method of manufacturing a semiconductor device where an electrode layer is formed on the surface of a semiconductor substrate. A resin insulation layer is then applied to cover the electrode layer. Notably, a tapered hole is created in the insulation layer using a tool bit with a rake angle of zero or negative value. This tapered hole features an opening defined by the insulation layer, a bottom defined by the electrode layer, and a side wall connecting the opening to the bottom. This innovative approach enhances the efficiency and effectiveness of semiconductor manufacturing.

Career Highlights

Kazuhito Katoh is associated with Denso Corporation, a leading company in the automotive technology sector. His work at Denso has allowed him to collaborate with other talented professionals in the field, contributing to advancements in semiconductor technology.

Collaborations

Some of his notable coworkers include Akira Tai and Kazuo Akamatsu. Their collective expertise and collaboration have further enriched the innovative environment at Denso Corporation.

Conclusion

Kazuhito Katoh's contributions to semiconductor technology through his patent and work at Denso Corporation highlight his role as an influential inventor. His innovative methods continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
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