This inventor holds 6 USPTO granted patents. Top assignees: Asahi Denka Kogyo Kabushiki Kaisha, Adeka Corporation, Asahi Denka Co., Ltd.. Active years: 1999-2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
3 out of 98 
1 out of 457 
1 out of 11 Years Active: 1999-2010
Title: Kazuhisa Onozawa: Innovator in Siloxane Compounds
Introduction
Kazuhisa Onozawa is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical engineering, particularly in the development of innovative compositions and processes.
Latest Patents
Onozawa holds a total of six patents, with his latest inventions focusing on a composition containing a siloxane compound and a phenol compound. This composition includes 100 parts by mass of a siloxane compound characterized by the formula —HSiRO, where R can be a hydrogen atom, a hydrocarbon group, an alkoxy group, or a phenoxy group. Additionally, it incorporates 0.0001 to 1 part by mass of at least one phenol compound as a stabilizer. His work also includes a process for forming thin films and a precursor for chemical vapor deposition.
Career Highlights
Throughout his career, Onozawa has worked with prominent companies such as Asahi Denka Kogyo Kabushiki Kaisha and Asahi Denka Co., Ltd. His expertise in chemical compositions has positioned him as a key figure in his field.
Collaborations
Onozawa has collaborated with notable colleagues, including Naoki Yamada and Toshiya Shingen. These partnerships have contributed to the advancement of his research and innovations.
Conclusion
Kazuhisa Onozawa's work in siloxane compounds and chemical processes showcases his innovative spirit and dedication to advancing technology. His contributions continue to impact the field significantly.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile