The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2002
Filed:
Dec. 06, 2000
Applicant:
Inventors:
Kazuhisa Onozawa, Tokyo, JP;
Toshiya Shingen, Tokyo, JP;
Assignee:
Asahi Denka Kogyo Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 1/08 ; C23G 1/600 ;
U.S. Cl.
CPC ...
C07F 1/08 ; C23G 1/600 ;
Abstract
A material for chemical vapor deposition comprising a &bgr;-diketonatocopper (II) complex which is liquid at room temperature.
Onozawa, Kazuhisa. (2002). Copper material for chemical vapor deposition and process for forming thin film using the same (U.S. Patent No. 6429325). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6429325
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile