Kazuhiro Sonoda

Title: Kazuhiro Sonoda: Innovator in Silicide Film Technology

Introduction

Kazuhiro Sonoda is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of materials science, particularly in the development of methods for forming silicide films. His innovative approaches have implications for various applications in semiconductor technology.

Latest Patents

Kazuhiro Sonoda holds a patent for a "Method for forming NiSi film, method for forming silicide film, method for forming metal film for use in silicide-annealing, apparatus for vacuum processing and film-forming apparatus." This patent outlines a method for the formation of a silicide film, which involves several steps. The process includes forming a nickel (Ni) film on a silicon (Si) substrate and subsequently heat-treating the Ni film to create an NiSi film. A preannealing treatment using hydrogen gas is applied to remove impurities from the Ni film before the silicide-annealing treatment is conducted.

Career Highlights

Kazuhiro Sonoda is currently associated with Ulvac, Inc., a company known for its advanced vacuum technology and equipment. His work at Ulvac has allowed him to focus on innovative solutions in film formation and processing techniques. His expertise in this area has positioned him as a key figure in the development of semiconductor manufacturing processes.

Collaborations

Throughout his career, Kazuhiro Sonoda has collaborated with esteemed colleagues such as Yasushi Higuchi and Toshimitsu Uehigashi. These collaborations have fostered a productive environment for innovation and have contributed to advancements in their respective fields.

Conclusion

Kazuhiro Sonoda's contributions to the field of silicide film technology exemplify the importance of innovation in semiconductor manufacturing. His patented methods and collaborative efforts continue to influence advancements in materials science.