Hiratsuka, Japan

Kazuhiro Mimura

This inventor holds 1 USPTO granted patent. Top assignee: Komatsu Denshi Kinzoku Kabushiki Kaisha. Active years: 2003.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Kazuhiro Mimura: Innovator in Melt Level Detection Technology

Introduction

Kazuhiro Mimura is a notable inventor based in Hirabsuka, Japan. He has made significant contributions to the field of melt level detection technology. His innovative approach has led to the development of a unique method and apparatus that enhances the efficiency of detecting melt levels in crystal growth furnaces.

Latest Patents

Kazuhiro Mimura holds a patent for a "Method and apparatus for detecting melt level." This invention provides a melt level detector designed for use in a Czochralski (CZ) furnace. The device utilizes triangulation to detect the melt level accurately. A laser beam from a laser source is moved radially within the crucible of the CZ furnace. This movement allows for the identification of a location where a photodetector system can receive the reflection from the melt level. The laser beam is then fixed at this location. This method minimizes noise interference and simplifies the device's complexity, resulting in more accurate measurements.

Career Highlights

Kazuhiro Mimura is associated with Komatsu Denshi Kinzoku Kabushiki Kaisha, a company known for its advancements in technology and engineering. His work has been instrumental in improving the processes involved in crystal growth, which is crucial for various applications in electronics and materials science.

Collaborations

Kazuhiro has collaborated with notable colleagues, including Tadayuki Hanamoto and Masato Moriya. Their combined expertise has contributed to the successful development of innovative technologies in their field.

Conclusion

Kazuhiro Mimura's contributions to melt level detection technology exemplify the impact of innovation in industrial applications. His patent reflects a significant advancement that enhances the precision of measurements in crystal growth processes. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
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