Kyoto, Japan

Kazuhiro Honsho

USPTO Granted Patents = 7 

Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2017-2024

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7 patents (USPTO):Explore Patents

Title: Kazuhiro Honsho: Innovator in Substrate Processing Technologies

Introduction

Kazuhiro Honsho is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 7 patents. His innovative work focuses on improving substrate treatment methods and systems, which are essential in various manufacturing processes.

Latest Patents

Honsho's latest patents include a substrate processing system and a substrate processing method. The substrate processing system features a first substrate holding unit designed to hold a substrate in a specific posture, allowing for the application of a protective film. This system includes a protective film coating nozzle, a turning unit for changing the substrate's posture, and a cleaning unit for maintaining the substrate's cleanliness. Additionally, the substrate treating apparatus he developed comprises a treating unit with a substrate holder, rotation driving unit, treatment liquid supplying unit, and a guard driving unit, all controlled by a sophisticated controller to adapt to the substrate's shape.

Career Highlights

Kazuhiro Honsho has dedicated his career to advancing substrate processing technologies. His work at Screen Holdings Co., Ltd. has positioned him as a key player in the industry. His innovative approaches have led to the development of efficient and effective substrate treatment methods that are widely recognized.

Collaborations

Honsho has collaborated with notable colleagues, including Mitsukazu Takahashi and Akito Hatano. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Kazuhiro Honsho's contributions to substrate processing technologies have made a significant impact in the field. His innovative patents and collaborative efforts continue to drive advancements in substrate treatment methods.

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