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For the Inventor, By the Inventor

Saitama, Japan

Kazuhiko Sakamoto

This inventor holds 8 USPTO granted patents. Top assignee: Ebara Research Co., Ltd.. Active years: 1991-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuhiko Sakamoto. Retrieved from https://idiyas.com/inventor/kazuhiko-sakamoto-9fd8udl1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 8

% Patents Active = 75.0

Average Co-Inventor Count = 3.2

ph-index = 4

Forward Citations = 82(Granted Patents)


Location History:

  • Saitama, JP (1991 - 1992)
  • Kanagawa, JP (1993)
  • Saitama-ken, JP (1999 - 2005)
  • Urawa, JP (2006)

Company Filing History:

goldMedal8 out of 32 
 
Ebara Research Co., Ltd.
 patents

Years Active: 1991-2006

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8 patents (USPTO):Explore Patents
1. 7029518 - Method and apparatus for the preparation of clean gases (2006-04-18),
2. 6911064 - Method and apparatus for the preparation of clean gases (2005-06-28),
3. 6733570 - Method and apparatus for the preparation of clean gases (2004-05-11),
4. 6340381 - Method and apparatus for the preparation of clean gases (2002-01-22),
5. 5922105 - Method and apparatus for the preparation of clean gases (1999-07-13),
6. 5225000 - Method for cleaning closed spaces with ultraviolet rays (1993-07-06),
7. 5154733 - Photoelectron emitting member and method of electrically charging fine (1992-10-13),
8. 5060805 - Photoelectron emitting member (1991-10-29),

Title: Kazuhiko Sakamoto: Innovator in Clean Gas Technology

Introduction

Kazuhiko Sakamoto is a prominent inventor based in Saitama-ken, Japan. He has made significant contributions to the field of clean gas technology, holding a total of 8 patents. His work primarily focuses on preventing contamination in high-tech industries, particularly in semiconductor and liquid crystal production.

Latest Patents

One of his latest patents is a method and apparatus for the preparation of clean gases. This invention aims to prevent contamination of substrates and substrate surfaces. It specifically addresses the contamination of raw materials, semi-finished products, and base materials in high-tech industries. The process involves purifying gas that comes into contact with a base material or substrate using dust removing and adsorption or absorption apparatus. The goal is to ensure that the concentration of fine particles in the gas is below class 1,000 and that the non-methane hydrocarbon concentration is below 0.2 ppm. After purification, the base material or substrate surface is exposed to this clean gas.

Career Highlights

Kazuhiko Sakamoto has been instrumental in advancing clean gas technology through his innovative patents. His work at Ebara Research Co., Ltd. has positioned him as a key figure in the industry. His inventions have contributed to improving the quality and reliability of products in high-tech manufacturing.

Collaborations

He has collaborated with notable coworkers, including Toshiaki Fujii and Hidetomo Suzuki. Their combined expertise has further enhanced the development of clean gas technologies.

Conclusion

Kazuhiko Sakamoto's contributions to clean gas technology have made a significant impact on high-tech industries. His innovative patents and collaborative efforts continue to advance the field, ensuring cleaner and more efficient production processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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