The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2006
Filed:
Mar. 15, 2005
Toshiaki Fujii, Kanagawa, JP;
Tsukuru Suzuki, Kanagawa, JP;
Hidetomo Suzuki, Kanagawa, JP;
Kazuhiko Sakamoto, Urawa, JP;
Toshiaki Fujii, Kanagawa, JP;
Tsukuru Suzuki, Kanagawa, JP;
Hidetomo Suzuki, Kanagawa, JP;
Kazuhiko Sakamoto, Urawa, JP;
Ebara Research Co., Ltd., Fujisawa, JP;
Abstract
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.