Tokuyama, Japan

Kazuhiko Hayashi


Average Co-Inventor Count = 4.7

ph-index = 4

Forward Citations = 52(Granted Patents)


Location History:

  • Tokuyama, JP (1999 - 2002)
  • Shinnanyo, JP (2002)

Company Filing History:


Years Active: 1999-2002

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Kazuhiko Hayashi: Innovator in Semiconductor Polishing Technologies

Introduction

Kazuhiko Hayashi is a notable inventor based in Tokuyama, Japan. He has made significant contributions to the field of semiconductor polishing technologies, holding a total of 4 patents. His work focuses on developing innovative methods and materials that enhance the efficiency and effectiveness of semiconductor wafer polishing.

Latest Patents

Hayashi's latest patents include groundbreaking inventions such as an abrasive and method for polishing semiconductor substrates. This invention utilizes a polishing agent that comprises silica particles as the main component, water as a solvent, and a water-soluble cellulose. The formulation is designed to flatten semiconductor wafers without causing damage to the wafer or the film formed on it, while also preventing dishing problems on the polished surface. Another significant patent is for a high-purity polishing slurry that provides materials with high scratch resistance and polishing efficiency. This slurry consists of water and silica particles with a specific size and refractive index, synthesized in a liquid phase without a drying step, ensuring minimal contamination during the polishing process.

Career Highlights

Throughout his career, Kazuhiko Hayashi has worked with Tokuyama Corporation, where he has contributed to advancements in semiconductor technologies. His expertise in polishing methods has positioned him as a key figure in the industry, driving innovation and improving manufacturing processes.

Collaborations

Hayashi has collaborated with notable colleagues such as Hiroshi Kato and Hiroyuki Kohno. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Kazuhiko Hayashi's contributions to semiconductor polishing technologies have made a significant impact on the industry. His innovative patents and collaborative efforts continue to advance the field, showcasing his dedication to improving semiconductor manufacturing processes.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…