This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Ushio Denki Kabushiki Kaisha. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Kazuaki Hota: Innovator in Extreme UV Radiation Technology
Introduction
Kazuaki Hota is a prominent inventor based in Sagamihara, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of extreme ultraviolet (EUV) radiation sources. His innovative work has implications for the future of semiconductor manufacturing.
Latest Patents
Hota holds a patent for an extreme UV radiation source and semiconductor exposure device. This patent describes a usable 13.5 nm radiation source in which tin (Sn) is the radiation substance. The invention allows for rapid transport with good reproducibility up to the plasma generation site. It also minimizes the formation of detrimental debris and coagulation of vapor. The emission of Sn ions is achieved by supplying Sn continuously or intermittently to the heating and excitation part. This process involves discharge heating and excitation or laser irradiation heating and excitation, converting the material into a plasma that emits extreme UV light with a main wavelength of 13.5 nm.
Career Highlights
Hota is associated with Ushio Denki Kabushiki Kaisha, a company known for its advancements in lighting and semiconductor technologies. His work at the company has positioned him as a key player in the development of cutting-edge technologies that enhance semiconductor manufacturing processes.
Collaborations
Hota collaborates with Tatumi Hiramoto, contributing to the advancement of their shared projects in the field of semiconductor technology.
Conclusion
Kazuaki Hota's innovative contributions to extreme UV radiation technology have the potential to revolutionize semiconductor manufacturing. His patent and ongoing work reflect his commitment to advancing this critical field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
