This inventor holds 2 USPTO granted patents. Top assignee: Ekc Technology Inc.. Active years: 2004-2009.
Company Filing History:
Years Active: 2004-2009
Title: Innovations by Katy Ip in Semiconductor Technology
Introduction
Katy Ip is a prominent inventor based in Oakland, CA, known for her contributions to semiconductor technology. She has been awarded 2 patents that focus on advanced processes for removing residues in semiconductor manufacturing.
Latest Patents
Her latest patents include a semiconductor process residue removal composition and process. This innovative residue remover is designed to eliminate polymeric material and etch residue. The composition features 2-(2-aminoethylamino)-ethanol, along with an optional two-carbon atom linkage alkanolamine compound, gallic acid or catechol, water, a polar organic solvent, and hydroxylamine. The process involves contacting a substrate, such as an integrated circuit semiconductor wafer with titanium metallurgy, with this composition for a specified time and temperature to effectively remove photoresist or other residues. The use of 2-(2-aminoethylamino)-ethanol ensures superior residue removal without damaging the titanium or other metallurgy on the substrate. Additionally, the composition is designed to have a flash point greater than about 130°C.
Career Highlights
Katy Ip is currently employed at EKC Technology Inc., where she continues to innovate in the field of semiconductor processes. Her work has significantly impacted the efficiency and effectiveness of residue removal in semiconductor manufacturing.
Collaborations
Katy collaborates with notable colleagues, including Xuan-Dung Dinh and David J Maloney, contributing to a dynamic team focused on advancing semiconductor technologies.
Conclusion
Katy Ip's innovative work in semiconductor technology showcases her expertise and commitment to improving manufacturing processes. Her patents reflect significant advancements that benefit the industry and highlight her role as a leading inventor in this field.