Katsuya Ogata

Title: Katsuya Ogata: Innovator in Semiconductor Technology

Introduction

Katsuya Ogata is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving the manufacturing processes and performance of semiconductor devices.

Latest Patents

Ogata's latest patents include a layout method and a method of manufacturing semiconductor devices. The layout method involves arranging a plurality of gate electrode patterns in parallel, which are alternately set as first and second patterns during the double patterning process. This innovative approach reduces the risk of variations in the characteristics of transistors caused by double patterning. His second patent describes a design support apparatus that generates circuit data based on layout information of a semiconductor integrated circuit. This apparatus includes a parameter determination unit that sets a parameter related to mechanical stress on transistors, thereby enhancing the mobility of the transistors reflected in the circuit data.

Career Highlights

Katsuya Ogata is currently employed at Fujitsu Semiconductor Limited, where he continues to advance semiconductor technology. His expertise and innovative mindset have positioned him as a key player in the industry.

Collaborations

Ogata has collaborated with notable colleagues such as Takanori Hiramoto and Toshio Hino. Their combined efforts contribute to the ongoing development of cutting-edge semiconductor solutions.

Conclusion

Katsuya Ogata's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to pave the way for advancements in semiconductor manufacturing and design.