The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Jun. 12, 2012
Takanori Hiramoto, Yokohama, JP;
Toshio Hino, Yokohama, JP;
Tsuyoshi Sakata, Yokohama, JP;
Yutaka Mizuno, Yokohama, JP;
Katsuya Ogata, Yokohama, JP;
Takanori Hiramoto, Yokohama, JP;
Toshio Hino, Yokohama, JP;
Tsuyoshi Sakata, Yokohama, JP;
Yutaka Mizuno, Yokohama, JP;
Katsuya Ogata, Yokohama, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
A plurality of gate electrode patterns to be laid out in parallel are alternately set as first patterns to be formed in a first exposure step of double patterning and as second patterns to be formed in a second exposure step. Subsequently, a circuit that includes transistor pairs each formed by connecting one of the first patterns and one of the second patterns in parallel is laid out. This reduces the risk of variations in characteristics of transistors caused by double patterning.