Company Filing History:
Years Active: 2010-2012
Title: Innovations by Katsuo Ooki
Introduction
Katsuo Ooki is a notable inventor based in Kasama, Japan. He has made significant contributions to the field of specimen inspection equipment, particularly in the area of electron beam technology. With a total of two patents to his name, his work has enhanced measurement efficiency in semiconductor device analysis.
Latest Patents
Katsuo Ooki's latest patents focus on specimen inspection equipment and methods for generating electron beam absorbed current images. The primary objective of his invention is to obtain clear absorbed current images without the influence of amplifier gain differences between inputs. This is achieved by utilizing multiple probes that come into contact with a specimen while it is irradiated with an electron beam. The currents flowing through the probes are measured, and signals from at least two probes are input to a differential amplifier. The output from the differential amplifier is then amplified, allowing for the generation of an absorbed current image based on the amplified output and the scanning information of the electron beam. This innovative approach significantly improves measurement efficiency during failure analysis of semiconductor devices.
Career Highlights
Katsuo Ooki is associated with Hitachi High-Technologies Corporation, where he continues to develop and refine his inventions. His work has been instrumental in advancing the capabilities of specimen inspection technologies.
Collaborations
Katsuo Ooki has collaborated with notable colleagues such as Tomoharu Obuki and Hiroshi Toyama. Their combined expertise has contributed to the success of their projects and innovations.
Conclusion
Katsuo Ooki's contributions to the field of specimen inspection equipment demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of technology and its applications in semiconductor analysis.