Company Filing History:
2 out of 42,508 
2 out of 1,641 Years Active: 1993
Title: Katsuo Ebisawa: Innovator in Thick Film Resistor Technology
Introduction
Katsuo Ebisawa is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor devices, particularly in thick film resistor technology. With a total of 2 patents, Ebisawa's work has had a lasting impact on the industry.
Latest Patents
Ebisawa's latest patents include a thick film resistor composition and a hybrid integrated circuit (IC) utilizing this composition. The thick film resistor material is especially suitable for hybrid ICs that incorporate conductors, resistors, and semiconductor elements, where copper is used as the conductor. This invention allows for firing in a reducing atmosphere, enhancing the performance of the thick film hybrid IC. Additionally, his semiconductor device patent describes a thick film resistor that contains boride particles of a metal dispersed in a glass matrix. This innovative design suppresses thermal stress and improves electroconductivity, with LaB6 being identified as a preferable boride for achieving distinguished resistor characteristics.
Career Highlights
Throughout his career, Katsuo Ebisawa has worked with prominent companies such as Hitachi, Ltd. and Hitachi Chemical Company, Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and materials science.
Collaborations
Ebisawa has collaborated with notable colleagues, including Osamu Ito and Tadamichi Asai. Their joint efforts have further advanced the field of thick film resistors and hybrid ICs.
Conclusion
Katsuo Ebisawa's innovative work in thick film resistor technology and semiconductor devices has established him as a key figure in the industry. His patents reflect a commitment to enhancing the performance and reliability of electronic components.