Tokyo, Japan

Katsunori Nagamatsu

This inventor holds 3 USPTO granted patents. Top assignee: Nec Corporation. Active years: 2000-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsunori Nagamatsu. Retrieved from https://idiyas.com/inventor/katsunori-nagamatsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2000-2001

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3 patents (USPTO):Explore Patents

Title: Katsunori Nagamatsu: Innovator in Laser Technology

Introduction

Katsunori Nagamatsu is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of laser technology, holding a total of 3 patents. His innovative work focuses on improving the accuracy and efficiency of laser beam applications.

Latest Patents

Nagamatsu's latest patents include a method and apparatus for checking shape. This invention involves controlling the level of a laser beam to the maximum level detectable by a sensor. The light transmitted through the pattern is normalized with branched light, allowing for compensation of variations in the laser beam level. Noise at zero and saturation levels is effectively removed, resulting in data that maintains a constant noise level in edge portions. This advancement significantly enhances pattern image accuracy, leading to sharper images.

Career Highlights

Katsunori Nagamatsu is associated with NEC Corporation, where he continues to develop innovative technologies. His work has been instrumental in advancing laser applications in various industries.

Collaborations

Nagamatsu has collaborated with notable coworkers, including Yukio Ogura and Shingo Murakami. Their combined expertise has contributed to the success of their projects and innovations.

Conclusion

Katsunori Nagamatsu is a key figure in the realm of laser technology, with a focus on enhancing image accuracy through innovative methods. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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