Katsumi Yasuda

Title: Innovations of Katsumi Yasuda

Introduction

Katsumi Yasuda is a notable inventor based in Ise, Japan, recognized for his contributions to technology through his innovative patents. With a total of five patents to his name, Yasuda has made significant advancements in the field of wafer detection and vacuum processing.

Latest Patents

One of Yasuda's latest inventions is the wafer detecting apparatus. This apparatus is designed to detect the storage states of multiple wafers stored in a container. The wafers are arranged horizontally in slots, allowing for efficient transfer through a front opening. The apparatus features a vertically extending illumination device that emits light onto the wafers, while an imaging device captures the reflected light to assess the wafers' conditions.

Another significant patent is the vacuum processing apparatus. This device includes a vacuum chamber that maintains a pressure lower than atmospheric levels. It incorporates a driving source within the chamber and an electric power supply mechanism that operates in a contactless manner. The design allows for a secondary mechanism to receive power while being housed in a vessel under higher pressure, ensuring efficient operation in a vacuum environment.

Career Highlights

Yasuda has worked with prominent companies such as Shinko Electric Company, Ltd. and Sinfonia Technology Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced technological solutions.

Collaborations

Throughout his career, Yasuda has collaborated with talented individuals, including Susumu Nakagawa and Tsukasa Sugino. These partnerships have fostered innovation and creativity in his projects.

Conclusion

Katsumi Yasuda's contributions to the field of technology through his patents demonstrate his innovative spirit and dedication to advancing industry standards. His work continues to influence the development of wafer detection and vacuum processing technologies.