Gunma-ken, Japan

Katsuma Baba


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Innovations of Katsuma Baba in Silicone Composition

Introduction

Katsuma Baba is a notable inventor based in Gunma-ken, Japan. He has made significant contributions to the field of silicone compositions, particularly with his innovative patent that enhances the functionality of various substrates. His work is recognized for its practical applications in everyday materials.

Latest Patents

Katsuma Baba holds a patent for a "Scratchable hiding layer-forming silicone composition." This invention comprises a diorganopolysiloxane with specific structural units, an organopolysiloxane, an inorganic powder opacifier, a curing catalyst, and an organic solvent. The composition is designed to form a hiding layer that adheres well to substrates such as paper, synthetic paper, and plastic film while remaining scratchable. This innovative approach allows for temporary adhesion, making it versatile for various applications.

Career Highlights

Katsuma Baba is associated with Shin-Etsu Chemical Co., Ltd., where he has been instrumental in developing advanced silicone materials. His expertise in polymer chemistry has led to breakthroughs that enhance product performance and usability in multiple industries.

Collaborations

Katsuma has collaborated with esteemed colleagues, including Kenji Yamamoto and Masahiko Ogawa. Their combined efforts have contributed to the advancement of silicone technologies and have fostered a collaborative environment that encourages innovation.

Conclusion

Katsuma Baba's contributions to silicone compositions exemplify the impact of innovative thinking in material science. His patent for a scratchable hiding layer-forming silicone composition showcases his ability to address practical challenges in the industry. Through his work at Shin-Etsu Chemical Co., Ltd., he continues to influence the field and inspire future innovations.

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