Shin-etsu Chemical Co., Ltd.

Katsuma Baba

Kenji Yamamoto

Masahiko Ogawa

A hiding layer-forming silicone composition comprising (A) a diorganopolysiloxane comprising structural units of formula (1) and having an average degree of polymerization of at least 50,wherein Ris alkyl or aryl, and Ris alkyl, aryl, alkenyl, alkoxy, alkoxyalkoxy, hydroxyl or epoxy, (B) an organopolysiloxane comprising structural units of formulae (2) and (3):(R&#x2014;)(R&#x2014;)Si&#x2014;O&#x2014;&#x2003;&#x2003;(2)wherein Rand Rare as defined above, n is an integer of 1 to 3, (C) an inorganic powder opacifier, (D) a curing catalyst, and (E) an organic solvent is effectively curable and capable of forming a hiding layer which temporarily adheres well to various substrates of paper, synthetic paper and plastic film while it remains scratchable.

Growing community of inventors

Gunma-ken, Japan

Katsuma Baba