Yokkaichi, Japan

Katsuji Douki

This inventor holds 1 USPTO granted patent. Top assignee: Jsr Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsuji Douki. Retrieved from https://idiyas.com/inventor/katsuji-douki-on34e6a5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Katsuji Douki: Innovator in Radiation-Sensitive Resin Composition

Introduction

Katsuji Douki is a notable inventor based in Yokkaichi, Japan. He has made significant contributions to the field of materials science, particularly in the development of radiation-sensitive resin compositions. His innovative work has led to advancements that are crucial for various applications in technology and manufacturing.

Latest Patents

Katsuji Douki holds 1 patent for a radiation-sensitive resin composition. This composition includes (A) an alkali-soluble novolak resin obtained by condensing a specific combination of a first phenol, which is essential for enhancing the performance of the resin in various applications.

Career Highlights

Throughout his career, Katsuji Douki has been associated with JSR Corporation, a leading company in the field of advanced materials. His work at JSR Corporation has allowed him to focus on innovative solutions that meet the evolving needs of the industry.

Collaborations

Katsuji Douki has collaborated with notable colleagues such as Shin-ichiro Iwanaga and Katsumi Inomata. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Katsuji Douki's contributions to the field of radiation-sensitive resin compositions highlight his role as an influential inventor. His work continues to impact the industry positively, showcasing the importance of innovation in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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