This inventor holds 1 USPTO granted patent. Top assignee: Canon Anelva Corporation. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: Katsuhiro Suzuki: Innovator in Thin Film Technology
Introduction
Katsuhiro Suzuki is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of thin film technology, particularly through his innovative patent work. His expertise and dedication to research have led to advancements that benefit various industries.
Latest Patents
Katsuhiro Suzuki holds a patent for a "Thin film forming apparatus, thin film forming method, and shield component." This invention addresses the issue of peel-off of an adherent film. The research conducted revealed that it is not essential to set the radius of curvature equal to or larger than a predetermined threshold to prevent this peel-off. The findings indicate that peel-off occurs in regions where the curvature of a shield changes, and it is less likely to happen when the change in curvature is minimal. By implementing a stepwise change in curvature, the invention effectively suppresses large changes, thus preventing peel-off without compromising film thickness distribution.
Career Highlights
Katsuhiro Suzuki is associated with Canon Anelva Corporation, where he continues to develop and refine his innovative ideas. His work has been instrumental in enhancing the performance and reliability of thin film applications.
Collaborations
Throughout his career, Katsuhiro has collaborated with talented individuals such as Akihiro Egami and Toshikazu Nakazawa. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.
Conclusion
Katsuhiro Suzuki's contributions to thin film technology exemplify the impact of innovative thinking in engineering. His patent work not only addresses critical challenges but also paves the way for future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile