Katsuhiro Kawai

Title: Katsuhiro Kawai: Innovator in Active Matrix Technology

Introduction

Katsuhiro Kawai is a prominent inventor based in Yamatotakada, Japan. He has made significant contributions to the field of technology, particularly in the development of active matrix substrates. With a total of 13 patents to his name, Kawai's work has had a substantial impact on the industry.

Latest Patents

One of Kawai's latest patents is for an active matrix substrate and its production method. This innovation features an insulating substrate with a matrix pattern of scanning lines and signal lines. It includes pixel electrodes in areas defined by these lines, along with switching elements that connect electrically to them. A notable aspect of this invention is a resistance control element that connects two selected lines while managing its resistance based on applied voltage. This design enhances the static electricity margin of the active matrix substrate and improves production yield without increasing manufacturing steps. Another significant patent involves a dry etching method for a silicon thin film. This method selectively etches a second silicon layer in a multilayer structure using an etching gas that includes freon-14 and either hydrogen chloride or chloride gas.

Career Highlights

Katsuhiro Kawai has worked with notable companies, including Sharp Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies.

Collaborations

Kawai has collaborated with esteemed colleagues such as Masaya Okamoto and Mikio Katayama. Their joint efforts have further advanced the innovations in their respective fields.

Conclusion

Katsuhiro Kawai's contributions to technology, particularly in active matrix substrates, showcase his innovative spirit and dedication to advancing the industry. His patents reflect a commitment to improving production methods and enhancing product performance.