Company Filing History:
Years Active: 2000-2006
Title: Innovations of Katsuhiko Tanaka
Introduction
Katsuhiko Tanaka is a prominent inventor based in Ome, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on enhancing the efficiency and functionality of semiconductor integrated circuits.
Latest Patents
Tanaka's latest patents include a semiconductor integrated circuit device that features a conductive film containing metal atoms bondable to a halogen element. This innovative semiconductor device is created through a series of steps involving the deposition of TiN and W films on a silicon oxide film, including the interior of a via-hole, using the CVD method. The films are then etched back to leave only the interior of the via-hole, forming a plug. Following this, a TiN film, Al-alloy film, and Ti film are deposited on the silicon oxide film, including the surface of the plug, using the sputtering method. The films are subsequently patterned to create second-layer wirings. Another notable patent is the method for fabricating semiconductor integrated circuits, which follows a similar process to the aforementioned device.
Career Highlights
Katsuhiko Tanaka is currently employed at Hitachi, Ltd., where he continues to innovate in the semiconductor field. His expertise and dedication have positioned him as a key figure in the development of advanced semiconductor technologies.
Collaborations
Tanaka has collaborated with notable coworkers, including Yoshitaka Nakamura and Tsuyoshi Tamaru. Their combined efforts contribute to the advancement of semiconductor innovations at Hitachi.
Conclusion
Katsuhiko Tanaka's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing electronic devices. His patents reflect a commitment to improving the efficiency and capabilities of integrated circuits, making a lasting impact in the field.