Company Filing History:
Years Active: 2006
Title: Innovations in Semiconductor Manufacturing: The Contributions of Katsuhiko Iizuka
Introduction: Katsuhiko Iizuka is an esteemed inventor based in Gunma, Japan, recognized for his significant contributions to the semiconductor industry. With two patents to his name, Iizuka's work particularly focuses on methods that enhance the manufacturing processes of semiconductor devices, addressing critical challenges such as thickness reduction and contamination.
Latest Patents: Iizuka’s latest innovations include a manufacturing method for semiconductor devices that successfully eliminates issues related to the reduction in thickness of silicon substrates and carbon contamination. The first patent describes a process where an LDD structure and silicide layer are formed without compromising the integrity of the silicon substrate. This method employs a two-step etching process, including both dry and wet etching, which not only prevents thickness reduction but also minimizes carbon contamination. In addition, this approach manages the depth variations of impurity concentration regions and silicide-forming areas by maintaining a high selection ratio during wet etching.
The second patent further elaborates on a manufacturing method that again ensures no reduction in substrate thickness or carbon contamination occurs while forming transistors with LDD structures and salicide technology. The process includes forming an insulation film on the gate electrode and utilizing spacers made from a specific insulation film material. The use of wet etching to create openings for silicide layers culminates in the fabrication of high-quality transistors that meet rigorous industry standards.
Career Highlights: Iizuka has been associated with Sanyo Electric Co., Ltd., where he has played a vital role in advancing semiconductor technologies. His innovative techniques have contributed to the company's reputation as a leader in semiconductor manufacturing.
Collaborations: Throughout his career, Iizuka has collaborated with notable colleagues, including Kazuo Okada and Tomonori Mori. Their joint efforts have fostered a collaborative environment that has propelled advancements in semiconductor manufacturing technologies and processes.
Conclusion: Katsuhiko Iizuka's contributions to semiconductor manufacturing are invaluable, demonstrating how innovation can resolve significant challenges within the industry. His patents reflect a deep understanding of materials and processes, leading to advancements that not only benefit Sanyo Electric Co., Ltd. but also the wider semiconductor ecosystem. As he continues to innovate, Iizuka stands as an inspiring figure for future inventors in the field.