Company Filing History:
Years Active: 2009
Title: Katshiro Kobayashi: Innovator in Photoresist Technology
Introduction
Katshiro Kobayashi is a notable inventor based in Joetsu, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of materials used in semiconductor manufacturing. His innovative work has led to the creation of a patented undercoat-forming material that enhances the performance of photoresists.
Latest Patents
Kobayashi holds a patent for a photoresist undercoat-forming material and patterning process. This material comprises a specific bisphenol compound that is effective in forming a photoresist undercoat. The undercoat-forming material has an extinction coefficient that provides an antireflective effect at a thickness of at least 200 nm. Additionally, it demonstrates high etching resistance, as evidenced by slow etching rates with CF/CHF and Cl/BCl gases during substrate processing. He has 1 patent to his name.
Career Highlights
Kobayashi is associated with Shin-Etsu Chemical Co., Ltd., a leading company in the chemical industry. His work at the company has focused on advancing materials that are crucial for the semiconductor sector. His contributions have been instrumental in improving the efficiency and effectiveness of photoresist applications.
Collaborations
Throughout his career, Kobayashi has collaborated with esteemed colleagues such as Jun Hatakeyama and Toshihiko Fujii. These collaborations have fostered innovation and have led to advancements in the field of photoresist technology.
Conclusion
Katshiro Kobayashi's work in developing photoresist undercoat-forming materials has made a significant impact on the semiconductor industry. His innovative approach and dedication to research continue to influence advancements in this critical field.