The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
May. 10, 2007
Jun Hatakeyama, Joetsu, JP;
Toshihiko Fujii, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Katshiro Kobayashi, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Toshihiko Fujii, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Katshiro Kobayashi, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A material comprising a specific bisphenol compound of formula (1) is useful in forming a photoresist undercoat wherein Rand Rare H, alkyl, aryl or alkenyl, Rand Rare H, alkyl, alkenyl, aryl, acetal, acyl or glycidyl, Rand Rare alkyl having a ring structure, or Rand Rbond together to form a ring. The undercoat-forming material has an extinction coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm, and a high etching resistance as demonstrated by slow etching rates with CF/CHFand Cl/BClgases for substrate processing.