Company Filing History:
Years Active: 2011
Title: Katrin Pietsch: Innovator in Semiconductor Technology
Introduction
Katrin Pietsch is a prominent inventor based in Solms, Germany. She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative spirit and technical expertise.
Latest Patents
Katrin's latest patents include a "Method for determining positions of structures on a substrate" and a "Device for measuring the position of at least one structure on a substrate." The first patent describes a system that includes multiple stations within a housing, with at least one movable station. This system is designed to maintain a consistent airflow, thanks to a filter fan unit and air-directing elements. The second patent focuses on a device that positions a substrate within a mirror body, ensuring that the substrate and a flat insert maintain the same optical thickness, regardless of the substrate's mechanical thickness.
Career Highlights
Katrin Pietsch is currently employed at Vistec Semiconductor Systems GmbH, where she continues to push the boundaries of semiconductor technology. Her work has been instrumental in developing advanced systems that enhance measurement accuracy and efficiency in semiconductor manufacturing.
Collaborations
Katrin collaborates with notable colleagues, including Klaus-Dieter Adam and Tillmann Ehrenberg, who contribute to her innovative projects and research endeavors.
Conclusion
Katrin Pietsch's contributions to semiconductor technology through her patents and work at Vistec Semiconductor Systems GmbH highlight her as a key figure in the field. Her innovative solutions continue to pave the way for advancements in technology.