This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2010.
Company Filing History:
Years Active: 2010
Title: Kathryn P Ta - Innovator in Electrochemical Plating Systems
Introduction
Kathryn P Ta is a notable inventor based in Saratoga, CA (US). She has made significant contributions to the field of electrochemical plating systems. Her innovative work focuses on enhancing the measurement of chemical concentrations in plating solutions.
Latest Patents
Kathryn holds a patent for a system and methods for measuring chemical concentrations of a plating solution. This electrochemical plating system includes one or more plating cell reservoirs for storing plating solution and a chemical analyzer in fluidic communication with these reservoirs. The chemical analyzer is designed to measure the chemical concentrations of the plating solution effectively. Additionally, the system features a plumbing system that facilitates fluidic communication between the reservoirs and the chemical analyzer while isolating the analyzer from electrical noise generated by the plating cells.
Career Highlights
Kathryn is currently employed at Applied Materials, Inc., where she continues to develop innovative solutions in her field. Her work has been instrumental in advancing the technology used in electrochemical plating.
Collaborations
Some of her notable coworkers include Alexander F Hoermann and Yevgeniy Rabinovich, who contribute to the collaborative environment at Applied Materials, Inc.
Conclusion
Kathryn P Ta's contributions to the field of electrochemical plating systems exemplify her innovative spirit and dedication to advancing technology. Her patent reflects her expertise and commitment to improving industrial processes.