Karthikeyan Sundaresan

Howell, NJ, United States of America

Karthikeyan Sundaresan

This inventor holds 77 USPTO granted patents and 12 published patent applications, plus 1 CIPO patent and 4 EPO patents, primarily in Wireless Communication (CPC class H04W). Top assignees: Nec Corporation, Nec Laboratories America, Inc., Nec C Orporation. Active years: 2010-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Karthikeyan Sundaresan. Retrieved from https://idiyas.com/inventor/karthikeyan-sundaresan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 77 

% Patents Active = 76.6


 

Average Co-Inventor Count = 3.0

ph-index = 8

Forward Citations = 275(Granted Patents)

Forward Citations (Not Self Cited) = 268(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Monmouth Junction, NJ (US) (2010 - 2012)
  • Princeton, NJ (US) (2012 - 2016)
  • Howell, NJ (US) (2012 - 2020)
  • Manalapan, NJ (US) (2017 - 2024)

Company Filing History:


Years Active: 2010-2026

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Areas of Expertise:
Localization
WiFi
RF Tracking
Drones
LiDAR
Sensor Fusion
Backscatter
Unmanned Aerial Vehicles
Mobile Networks
Interference Management
Radio Frequency Identification
Dynamic Environments
77 patents (USPTO):Explore Patents

Title: Karthikeyan Sundaresan: Innovator Extraordinaire in Howell, NJ

Introduction:

In the world of innovations and patents, Karthikeyan Sundaresan stands out as a luminary. Hailing from Howell, NJ in the United States, Sundaresan has been instrumental in revolutionizing wireless technologies, tracking systems, and more. With an impressive portfolio of 71 patents to his name, his pioneering work has garnered recognition and respect in the industry.

Latest Patents:

Among his latest patents, one notable invention stands out: "Reading Passive Wireless Tags using Commodity Devices." This innovation introduces a novel method for product tagging utilizing dual-tone radio frequency (RF) signals embedded within standardized RF signals. By reflecting and frequency shifting the dual-tone RF signals using a passive RF backscatter tag, products can be efficiently read on different frequency channels. This technology has the potential to streamline and enhance inventory management systems.

Another groundbreaking patent from Sundaresan is "Infrastructure-Free Tracking and Response." This invention focuses on localization within dynamic indoor environments. By determining the topology estimate of nodes based on measured distances between them, relative localizations are transformed into absolute localizations. This enables the creation of accurate maps and facilitates the deployment of features to devices within the environment.

Career Highlights:

Throughout his career, Sundaresan has made significant contributions to the technology sector. He has worked with esteemed companies such as NEC Corporation and NEC Laboratories America, Inc. (NEC Labs). At NEC Corporation, a global leader in IT and networking solutions, Sundaresan might have played a pivotal role in their research and development endeavors. NEC Labs, renowned for its innovative approach, offered him a platform to explore and refine his ideas.

Collaborations:

Sundaresan has had the privilege of collaborating with exceptional peers in his field. Notably, he has worked alongside Sampath Rangarajan and Mohammad Ali Khojastepour, who are themselves highly regarded innovators. These collaborations have been instrumental in driving forward groundbreaking technological advancements and fostering a spirit of innovation.

Conclusion:

Karthikeyan Sundaresan's remarkable journey as an inventor and his impressive array of patents underscore his pioneering spirit in the world of technology. His inventions have the potential to reshape industries, optimize processes, and improve everyday experiences. As a gifted engineer and scientist, Sundaresan continues to shape the future through his innovative mindset and dedication to technological advancement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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