Trebesing, Austria

Karin Schrettlinger


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2012-2019

where 'Filed Patents' based on already Granted Patents

5 patents (USPTO):

Title: The Innovations of Karin Schrettlinger

Introduction

Karin Schrettlinger is a prominent inventor based in Trebesing, Austria. She has made significant contributions to the field of semiconductor technology, holding a total of five patents. Her work focuses on innovative methods for processing substrates and producing semiconductor components.

Latest Patents

Karin's latest patents include a semiconductor component and methods for processing a substrate. One of her notable methods involves forming a metallization layer above at least one first region of a substrate, while ensuring that at least one second region remains free of the metallization layer. This method also includes the formation of a barrier layer that directly adjoins the metallization layer in the first region. Additionally, she has developed a method for manufacturing semiconductor devices that utilize a glass substrate, which allows for a firm mechanical and electrical connection between a semiconductor chip and a metal layer of a carrier substrate.

Career Highlights

Throughout her career, Karin has worked with leading companies in the semiconductor industry, including Infineon Technologies Austria AG and Infineon Technologies AG. Her expertise and innovative approaches have positioned her as a key figure in the development of advanced semiconductor technologies.

Collaborations

Karin has collaborated with notable professionals in her field, including Carsten Von Koblinski and Gerald Lackner. These partnerships have further enhanced her contributions to semiconductor innovation.

Conclusion

Karin Schrettlinger is a trailblazer in semiconductor technology, with a strong portfolio of patents and a successful career in the industry. Her innovative methods and collaborations continue to influence the field, showcasing her dedication to advancing technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…