This inventor holds 3 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Mosel Vitelic Corporation. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Karen Wong: Innovator in Chemical Mechanical Polishing Technologies
Introduction
Karen Wong is a prominent inventor based in Milpitas, CA (US), known for her significant contributions to the field of chemical mechanical polishing (CMP). With a total of 3 patents to her name, she has developed innovative methods that enhance the efficiency and effectiveness of CMP processes, particularly in semiconductor manufacturing.
Latest Patents
One of her latest patents is a method for breaking in polishing pads used in CMP tools. This method utilizes a silica-based CMP slurry to condition the polishing pad into a steady operating state, which is then followed by the use of a ceria-based CMP slurry for polishing patterned workpieces, such as semiconductor wafers. This approach not only shortens the break-in time but also eliminates the first wafer effect commonly observed after break-in with ceria-based slurries.
Another notable patent involves a torque-based end-point detection method for CMP tools that use ceria-based slurries. This method employs a torque-based algorithm to determine the optimal time to stop polishing. It is particularly useful for pre-patterned and pre-polished workpieces that have varying friction layers. The algorithm identifies a reliable signature point in the friction versus time waveform, which is used to trigger a specified duration of overpolish, ensuring consistent results in mass production.
Career Highlights
Karen Wong has made a significant impact in her field through her innovative approaches to CMP technology. Her work has been instrumental in improving the reliability and efficiency of semiconductor manufacturing processes.
Collaborations
Throughout her career, Karen has collaborated with notable colleagues, including Kuo-Chun Wu and Wee-chen Richard Gan. These collaborations have further enriched her research and development efforts in CMP technologies.
Conclusion
Karen Wong is a trailblazer in the field of chemical mechanical polishing, with her patents reflecting her commitment to innovation and excellence. Her contributions continue to shape the future of semiconductor manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile