Pflugerville, TX, United States of America

Karen L E Turnqest

This inventor holds 2 USPTO granted patents. Top assignee: Advanced Micro Devices Corporation. Active years: 2002-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Karen L E Turnqest. Retrieved from https://idiyas.com/inventor/karen-l-e-turnqest

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2002-2003

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2 patents (USPTO):Explore Patents

Title: Karen L E Turnqest: Innovator in Semiconductor Technology

Introduction

Karen L E Turnqest is a prominent inventor based in Pflugerville, TX (US). She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative spirit and technical expertise.

Latest Patents

Her latest patents include a method of reducing photoresist shadowing during angled implants. This invention is directed to a method of forming halo implants in a semiconductor device. In one illustrative embodiment, the method comprises forming a structure above a semiconducting substrate, forming a layer of photoresist above the structure and the substrate, and positioning the substrate in an exposure tool that has a light source and a focal plane. The method further comprises positioning the surface of the layer of photoresist in an exposure plane that is different from the focal plane of the exposure tool, exposing the photoresist to the light source of the exposure tool while the surface of the photoresist is in the exposure plane, and developing the layer of photoresist to define an opening in the layer of photoresist around the structure on the substrate. Another notable patent is for a method for forming a vertical profile of polysilicon gate electrodes. This invention involves forming a layer of polysilicon, forming a masking layer above the layer of polysilicon, and patterning the masking layer to expose portions of the layer of polysilicon. The method further comprises implanting a dopant material into the exposed portions of the layer of polysilicon to convert the exposed portions of the layer of polysilicon to substantially amorphous silicon, and performing an etching process to remove the substantially amorphous silicon to define a gate electrode.

Career Highlights

Karen is currently employed at Advanced Micro Devices Corporation, where she continues to push the boundaries of semiconductor innovation. Her work has been instrumental in advancing technologies that are critical to modern electronics.

Collaborations

Throughout her career, Karen has collaborated with notable colleagues, including William R Roche and Scott D Luning. These partnerships have fostered a creative environment that has led to groundbreaking advancements in the semiconductor field.

Conclusion

Karen L E Turnqest is a remarkable inventor whose contributions to semiconductor technology have made a lasting impact. Her innovative patents and collaborative efforts exemplify her dedication to advancing the field

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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