Warrington, PA, United States of America

Karen A Graziano

This inventor holds 1 USPTO granted patent. Top assignee: Rohm and Haas Company. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Karen A Graziano. Retrieved from https://idiyas.com/inventor/karen-a-graziano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: The Innovations of Karen A Graziano

Introduction

Karen A Graziano is an accomplished inventor based in Warrington, PA (US). She has made significant contributions to the field of photoresists, particularly through her innovative patent that enhances lithographic potential. Her work is recognized for its impact on the development of more sensitive photoresist materials.

Latest Patents

Karen A Graziano holds a patent for "Acid-hardening photoresists comprising a purified hexamethoxy." This patent discloses photoresists that exhibit increased sensitivity compared to traditional photoresists containing melamine resin as a crosslinker. The innovation lies in the formulation, which includes a higher percentage by weight of monomeric hexamethoxymethylmelamine than is found in known resists.

Career Highlights

Graziano is associated with Rohm and Haas Company, where she has been instrumental in advancing the company's research and development efforts in photoresist technology. Her expertise has contributed to the company's reputation as a leader in the chemical industry.

Collaborations

Throughout her career, Karen has collaborated with notable colleagues, including Leonard Edward Bogan, Jr. and Robert J Olsen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Karen A Graziano's contributions to the field of photoresists exemplify her dedication to innovation and excellence. Her patent reflects a significant advancement in the technology, showcasing her role as a leading inventor in her field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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