Yokohama, Japan

Kaoru Sakoda


Average Co-Inventor Count = 8.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Tokyo, JP (2011)
  • Yokohama, JP (2013)

Company Filing History:


Years Active: 2011-2013

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2 patents (USPTO):Explore Patents

Title: Kaoru Sakoda: Innovator in Insulating Film Materials

Introduction

Kaoru Sakoda is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of materials science, particularly in the development of insulating film materials. With a total of 2 patents, his work has implications for semiconductor devices and other advanced technologies.

Latest Patents

Sakoda's latest patents include an insulating film material and a method of film formation using this material. The insulating film material is designed for plasma CVD and is characterized by a low dielectric constant and superior copper diffusion barrier properties. This innovation is particularly suitable for interlayer insulating films in semiconductor devices. The chemical formula associated with this invention specifies that "n" represents an integer from 3 to 6, with each of the R groups independently representing various hydrocarbon chains. Additionally, he has developed a granular material comprising porous particles containing calcium and/or magnesium, which boasts high strength and a large BET specific surface area.

Career Highlights

Throughout his career, Kaoru Sakoda has worked with notable organizations such as Taiyo Nippon Sanso Corporation and the National Institute for Materials Science. His experience in these institutions has allowed him to refine his expertise in materials development and innovation.

Collaborations

Sakoda has collaborated with esteemed colleagues, including Takahisa Ohno and Nobuo Tajima. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Kaoru Sakoda's contributions to the field of insulating film materials highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving semiconductor device performance and materials science.

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