Kao-Shuo Chang

Title: Kao-Shuo Chang: Innovator in Thin-Film Technology

Introduction

Kao-Shuo Chang is a notable inventor based in Greenbelt, MD (US). He has made significant contributions to the field of microelectronics and optoelectronics through his innovative work on thin-film technologies. His expertise and dedication have led to the development of advanced fabrication methods that enhance the functionality of electronic devices.

Latest Patents

Kao-Shuo Chang holds a patent for a system and method of fabrication and application of thin-films with continuously graded or discrete physical property parameters to functionally broadband monolithic microelectronic optoelectronic/sensor/actuator device arrays. This patent describes a method for fabricating thin-films that possess varying physical property parameters or that change continuously across device arrays. The process involves depositing layers on a substrate of a monolithic chip, defining gradient profiles for each layer, and aligning a mask aperture to form the thin-film. The method calculates a shutter speed for the specified gradient profile, allowing for precise layer deposition.

Career Highlights

Kao-Shuo Chang is affiliated with the University System of Maryland, where he continues to advance research in thin-film technologies. His work has garnered attention for its potential applications in various electronic devices, enhancing their performance and efficiency.

Collaborations

Throughout his career, Kao-Shuo Chang has collaborated with esteemed colleagues such as Ichiro Takeuchi and Wei Yang. These partnerships have fostered innovation and contributed to the advancement of research in their respective fields.

Conclusion

Kao-Shuo Chang's contributions to thin-film technology exemplify the impact of innovative thinking in the field of microelectronics. His patent and ongoing research continue to pave the way for advancements in electronic device fabrication.