Kanagawa, Japan

Kanji Yaginuma

This inventor holds 1 USPTO granted patent. Top assignee: Ulvac, Inc.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kanji Yaginuma. Retrieved from https://idiyas.com/inventor/kanji-yaginuma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Kanji Yaginuma: Innovator in Sputtering Technology

Introduction

Kanji Yaginuma is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of sputtering technology, particularly through his innovative patent for a sputtering apparatus. His work has implications for various applications in thin film deposition.

Latest Patents

Yaginuma holds a patent for a sputtering apparatus that features a vacuum chamber containing a target. This apparatus allows for the rotation of a circular substrate at a predetermined speed while the target is sputtered to form a thin film on the substrate's surface. The design includes a stage that rotatably holds the substrate, offset from the target's center, and a shielding plate that permits the passage of sputtered particles through an opening that gradually increases in area.

Career Highlights

Kanji Yaginuma is associated with Ulvac, Inc., a company known for its advanced vacuum technology and equipment. His work at Ulvac has positioned him as a key player in the development of innovative sputtering solutions.

Collaborations

Yaginuma collaborates with Katsuaki Nakano, contributing to advancements in sputtering technology and enhancing the capabilities of their apparatus.

Conclusion

Kanji Yaginuma's contributions to sputtering technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the development of thin film deposition techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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