Tokyo, Japan

Kanemitsu Murakami

This inventor holds 2 USPTO granted patents. Top assignee: Sony Corporation. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kanemitsu Murakami. Retrieved from https://idiyas.com/inventor/kanemitsu-murakami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1987

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2 patents (USPTO):Explore Patents

Title: Kanemitsu Murakami and Electron-Gun Innovation.

Introduction

Kanemitsu Murakami is an inventor associated with Sony Corporation in Tokyo, Japan. His recorded work includes 2 patents focused on electron-gun designs for color display apparatuses.

Latest Patents

Murakami’s listed patents address electron-gun performance, including beam focusing and lens design.

“Electron gun for a color display apparatus” describes a three-beam electron gun with a central cathode and two side cathodes. Its grid shapes, indentations, and varying dimensions are designed to support suitable focusing voltages for the different beams across operating current ranges.

“Electron gun with low spherical aberration” describes a unipotential electron gun with front and rear lens systems formed by grids. The design uses different lens and aperture diameters to reduce spherical aberration and improve electron-beam focusing.

Career Highlights

Murakami’s patent work at Sony reflects engineering efforts to refine electron guns used in color display technology. The inventions focus on controlling beam paths and improving the optical characteristics of electron lenses.

Collaborations

The provided information identifies Masahiro Kikuchi and Yukinobu Iguchi as Murakami’s coworkers. It does not specify their roles in the listed patents.

Conclusion

Kanemitsu Murakami’s recorded inventions demonstrate a focused contribution to electron-gun design, particularly in beam focusing and reducing spherical aberration for display applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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