The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 1987

Filed:

Nov. 27, 1985
Applicant:
Inventors:

Yukinobu Iguchi, Tokyo, JP;

Kanemitsu Murakami, Tokyo, JP;

Masahiro Kikuchi, Tokyo, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
313414 ; 313412 ;
Abstract

An improved electron gun beam for a three color gun which has a central cathode and side cathodes mounted on either side of the central cathode which produce beams for different colors which pass through first and second grids and a main electron lens and wherein the first and second grids are generally conically shaped so that they extend toward the central cathode and have further indentations in their central portion which extend toward the central cathode and wherein the thickness of the second grid at the center wherein the beam of the central cathode passes therethrough is less than at the portions of the second grid where the beams from the two side cathodes pass therethrough and also where the distance between the central cathode and the indented portion of the first grid is larger than the distance between the two side cathodes and the distance to the first grid and/or the distance between the second and first grids is larger at the portion where the central cathode beam passes therethrough than where the beams of the two side cathdoes pass therethrough so as to provide optimum focusing voltage values and the voltage difference for optimum focusing for the respective beams is constand over the entire cathode current operating ranges.


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