Company Filing History:
Years Active: 2015-2019
Title: Kanako Meya: Innovator in Pattern-Forming Technologies
Introduction
Kanako Meya is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of pattern-forming methods and compositions, holding 2 patents to her name. Her work is particularly relevant in the semiconductor and materials science industries.
Latest Patents
Meya's latest patents include a "Pattern-forming method and composition for resist pattern-refinement." This innovative method involves creating a prepattern that is either insoluble or hardly soluble in an organic solvent. A first composition is applied to the lateral faces of the prepattern to form a resin layer. The adjacent regions of the resin layer are treated to become insolubilized or desolubilized without increasing the molecular weight by heating. The first composition contains a polymer whose solubility decreases in the presence of an acid, and it may also include a basic compound.
Another notable patent is her "Double patterning method," which outlines a process for creating a first resist film on a substrate using a photoresist composition. This method includes exposing and developing the first resist film to form a pattern, followed by the application of a second resist film in the spaces of the first pattern. The first resist pattern remains insoluble in the second developer, allowing for precise patterning.
Career Highlights
Kanako Meya is currently employed at JSR Corporation, where she continues to advance her research and development efforts. Her work has been instrumental in enhancing the efficiency and effectiveness of pattern-forming technologies.
Collaborations
Meya collaborates with notable colleagues, including Takeo Shioya and Motoyuki Shima, contributing to a dynamic research environment that fosters innovation.
Conclusion
Kanako Meya is a trailblazer in the field of pattern-forming technologies, with her patents reflecting her commitment to advancing the industry. Her contributions are paving the way for future innovations in materials science and semiconductor manufacturing.