Company Filing History:
Years Active: 2001
Title: Innovations of Kan-Yuan Lee
Introduction
Kan-Yuan Lee is a notable inventor based in Tainan Hsien, Taiwan. He has made significant contributions to the field of anti-reflection coating technologies. With a total of 3 patents to his name, Lee continues to push the boundaries of innovation in his area of expertise.
Latest Patents
One of his latest patents is a method of stabilizing an anti-reflection coating (ARC) layer. This method involves providing a substrate with a dielectric layer, a conductive layer, and the ARC layer formed thereon. The ARC layer undergoes an alloy treatment step prior to the formation of a photoresist layer, ensuring the specificity of the ARC layer is stabilized for accurate pattern transfer. Another patent by Lee also focuses on stabilizing the ARC layer, utilizing an ultraviolet (UV) curing step before the photoresist layer is applied. This process allows for precise replication of the desired pattern in the photoresist layer.
Career Highlights
Kan-Yuan Lee is currently employed at United Microelectronics Corporation, where he applies his expertise in developing advanced coating technologies. His work has been instrumental in enhancing the performance and reliability of semiconductor devices.
Collaborations
Lee has collaborated with notable colleagues such as Joe Ko and Gary Y Hong, contributing to various projects that aim to innovate and improve existing technologies.
Conclusion
Kan-Yuan Lee's contributions to the field of anti-reflection coatings demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in semiconductor technology.