Tokyo, Japan

Kan-go Chung


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Kan-go Chung: Innovator in Semiconductor Cleaning Solutions

Introduction

Kan-go Chung is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of cleaning compositions for semiconductor substrates. His innovative approach has led to the creation of a unique cleaning solution that addresses the specific needs of the semiconductor industry.

Latest Patents

Kan-go Chung holds a patent for a cleaning composition designed for semiconductor substrates. This composition includes a novolak resin, an organic acid that is not a polymeric compound, and a solvent. The solid content concentration of this composition is no greater than 20% by mass. The organic acid is preferably a carboxylic acid, which can be a monocarboxylic acid, polycarboxylic acid, or a combination of both. The molecular weight of the organic acid is ideally between 50 and 500. The content of the organic acid in relation to 10 parts by mass of the novolak resin ranges from 0.001 parts by mass to 10 parts by mass. The solvent is preferably an ether solvent, an alcohol solvent, or a combination thereof, with the proportion of these solvents being no less than 50% by mass.

Career Highlights

Kan-go Chung is currently employed at JSR Corporation, where he continues to innovate and develop new solutions for the semiconductor industry. His work has been instrumental in enhancing the efficiency and effectiveness of cleaning processes for semiconductor substrates.

Collaborations

Throughout his career, Kan-go Chung has collaborated with talented individuals such as Shun Aoki and Tomohiro Matsuki. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Kan-go Chung is a distinguished inventor whose work in semiconductor cleaning compositions has made a significant impact on the industry. His innovative solutions continue to pave the way for advancements in semiconductor technology.

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