Company Filing History:
Years Active: 1983-1985
Title: Innovations by Kamal Tabatabaie-Alavi in Ion Implantation Technologies
Introduction
Kamal Tabatabaie-Alavi is an accomplished inventor based in Cambridge, MA, with a focus on advanced semiconductor technologies. He holds two notable patents that enhance the production and efficiency of electronic devices. His work primarily involves ion implantation techniques, which are crucial for the fabrication of semiconductor materials.
Latest Patents
One of his latest patents is titled "Dual Species Ion Implantation of Ternary Compounds Based on In-Ga-As." This patent presents a method for ion implantation using Be.sup.+ ions at multiple energies. It aims to produce p-type regions in n-In.sub.0.53 Ga.sub.0.47 As. The technique also includes a capless annealing process for InGaAs that can withstand temperatures up to 700°C. Additionally, the patent highlights the creation of n.sup.+ layers in previously Be-implanted InGaAs epilayers, achieving an active efficiency of 40% with 50 KeV Be implant, and efficiencies of 86% and 38% for low and high energy Si implants respectively.
His second patent is focused on achieving a low resistance ohmic contact on p-type Indium Phosphide (InP). This method involves a light-assisted plating technique using gold (Au) and zinc (Zn) with alternating positive and negative current pulses. This innovative approach allows for the production of patterned, small area contacts on device structures, proving to be compatible with established n-type ohmic contacting procedures.
Career Highlights
Kamal Tabatabaie-Alavi has made significant contributions to the field of semiconductor technology, particularly while working with the United States of America, as represented by the Secretary of the Navy. His extensive knowledge and innovative methods have positioned him as a leader in the development of ion implantation techniques.
Collaborations
Throughout his career, he has collaborated with notable colleagues, including Abu N Choudhury and Clifton G Fonstad. These partnerships have contributed to the advancement of their collective research efforts, leading to groundbreaking technologies and improved methodologies in semiconductor production.
Conclusion
Kamal Tabatabaie-Alavi stands out as an inventive force in the realm of ion implantation technologies. His patents reflect a commitment to innovation, efficiency, and the advancement of semiconductor technology. As he continues to develop new techniques, his work will surely play a pivotal role in the future of electronic device fabrication.