Kam-Tung Li

Title: Innovations of Kam-Tung Li

Introduction

Kam-Tung Li is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in methods related to alignment and measurement processes.

Latest Patents

Kam-Tung Li holds 2 patents that showcase his innovative approaches. One of his latest patents is a "Method for protecting stepper alignment marks." This method is designed for substrates with alignment marks on a scribe line and a metal layer that will be etched. The process involves forming a photoresist layer over the metal layer, providing a photo mask with a predefined pattern, and performing a photolithographic process to create a protective mask for the alignment marks.

Another significant patent is the "Method for actually measuring misalignment of via." This invention details a process for accurately measuring the misalignment of a via formed by etching an inter metal dielectric layer. The method includes using a photoresist with a via pattern as a mask, etching a patterned metal interconnection line, and detecting actual misalignment through Scanning Electron Microscopy (SEM).

Career Highlights

Kam-Tung Li is currently associated with Mosel Vitelic Corporation, where he applies his expertise in semiconductor technologies. His work has contributed to advancements in the industry, particularly in enhancing the precision of manufacturing processes.

Collaborations

Throughout his career, Kam-Tung Li has collaborated with notable colleagues, including Chung-Chih Yeh and Kuan-Chieh Huang. These collaborations have fostered innovation and development in their respective fields.

Conclusion

Kam-Tung Li's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative methods continue to influence advancements in manufacturing processes.