High Point, NC, United States of America

Kalyan Nunna

This inventor holds 1 USPTO granted patent. Top assignee: Iqe Plc. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kalyan Nunna. Retrieved from https://idiyas.com/inventor/kalyan-nunna

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Kalyan Nunna: Innovator in Optoelectronic Detectors

Introduction

Kalyan Nunna is a notable inventor based in High Point, NC (US). He has made significant contributions to the field of optoelectronics, particularly through his innovative patent.

Latest Patents

Kalyan Nunna holds a patent for "Optoelectronic detectors having a dilute nitride layer on a substrate with a lattice parameter nearly matching GaAs." This invention describes optoelectronic detectors that utilize one or more dilute nitride layers on substrates with lattice parameters that match or nearly match GaAs. The semiconductor structure includes a substrate with a lattice parameter that aligns closely with GaAs, a first doped III-V layer, an absorber layer with a bandgap between approximately 0.7 eV and 0.95 eV, and a second doped III-V layer. This innovative design enhances the performance of optoelectronic devices.

Career Highlights

Kalyan Nunna is currently associated with IQE PLC, a leading company in the semiconductor industry. His work focuses on advancing optoelectronic technologies, contributing to the development of high-performance devices.

Collaborations

Kalyan collaborates with esteemed colleagues such as Robert Yanka and Seokjae Chung. Their combined expertise fosters innovation and drives advancements in their field.

Conclusion

Kalyan Nunna's contributions to optoelectronic detectors exemplify the importance of innovation in technology. His work continues to influence the semiconductor industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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