Kaiyuan Wang

Title: Innovations of Inventor Kaiyuan Wang

Introduction

Kaiyuan Wang is a prominent inventor based in Atlanta, GA (US). He has made significant contributions to the field of photoelectrochemistry and semiconductor technology. With a total of 2 patents, his work focuses on advanced methods for fabricating three-dimensional structures and enhancing semiconductor performance.

Latest Patents

Wang's latest patents include innovative methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate. His work involves additively depositing metal and dopant atoms onto the surface and diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, generating a spatial pattern of electron-hole pairs through a specified intensity, wavelength, and duration of illumination. This process allows for the creation of a spatially varying doping profile in the semiconductor substrate, which is essential for developing photonic integrated circuits and microfluidic circuits.

Career Highlights

Kaiyuan Wang is affiliated with the University of Illinois, where he continues to push the boundaries of semiconductor technology. His research has led to advancements in photodetectors and integrated circuits, showcasing his expertise in the field.

Collaborations

Wang has collaborated with notable colleagues, including Lynford L. Goddard and Chris Edwards, contributing to a dynamic research environment that fosters innovation.

Conclusion

Kaiyuan Wang's contributions to the field of photoelectrochemistry and semiconductor technology highlight his role as a leading inventor. His innovative patents and collaborations reflect his commitment to advancing technology and improving semiconductor applications.