The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
May. 22, 2018
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Lynford Goddard, Champaign, IL (US);
Kaiyuan Wang, Atlanta, GA (US);
Chris Edwards, Chandler, AZ (US);
Lonna Edwards, Louisville, KY (US);
Xin Yu, Urbana, IL (US);
Gang Logan Liu, Champaign, IL (US);
Samuel Washington, Urbana, IL (US);
Shailendra Srivastava, Urbana, IL (US);
Terry Koker, Gibson City, IL (US);
Julianne Lee, Savoy, IL (US);
Catherine Britt Carlson, Saint Joseph, IL (US);
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Abstract
Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. Charge carriers are driven away from the surface of the semiconductor on a timescale short compared to the carrier recombination lifetime. Such methods are applied to creating a spatially varying doping profile in the semiconductor substrate, a photonic integrated circuit and an integrated photonic microfluidic circuit.