Gunma, Japan

Kaito Suzuki

This inventor holds 1 USPTO granted patent. Top assignees: Kitz Sct Corporation, Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kaito Suzuki. Retrieved from https://idiyas.com/inventor/kaito-suzuki-ncswomya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kaito Suzuki: Innovator in Substrate Processing Technology

Introduction

Kaito Suzuki is a notable inventor based in Gunma, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work focuses on improving the efficiency and cleanliness of vacuum processing chambers.

Latest Patents

Kaito Suzuki holds 1 patent for his invention related to a gate valve, a substrate processing apparatus, and a substrate processing method. This invention enhances the airtightness and cleanliness of vacuum processing chambers and vacuum preliminary chambers. The gate valve features faces that abut on annular sealing members surrounding the substrate loading/unloading ports. It is designed to open and close the connection between the vacuum processing chamber and the vacuum preliminary chamber. The invention includes sealing channels and a gas circulation channel that contribute to its effectiveness.

Career Highlights

Throughout his career, Kaito Suzuki has worked with prominent companies in the industry. He has been associated with Kitz Sct Corporation and Tokyo Electron Limited. His experience in these organizations has allowed him to develop and refine his innovative ideas.

Collaborations

Kaito Suzuki has collaborated with various professionals in his field. One of his notable coworkers is Yoshifumi Hoshino. Their joint efforts have contributed to advancements in substrate processing technology.

Conclusion

Kaito Suzuki is a distinguished inventor whose work has significantly impacted substrate processing technology. His innovative gate valve design showcases his commitment to improving vacuum processing efficiency. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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